Physics-Driven PECVD Process Optimization for Semiconductors
Semiconductor manufacturing is at the heart of modern technology, powering everything from smartphones to advanced computing systems. One of the key innovations in this field is the use of plasma technology, which enables precise chemical control and the production of high-quality, uniform films essential for device fabrication.
Plasma enhanced chemical vapor deposition (PECVD) is a cornerstone process in advanced semiconductor manufacturing. It is crucial for creating:
- Interlayer dielectrics (ILDs)
- Passivation and encapsulation layers
- Hardmasks and etch stop layers
- Advanced packaging and 3D integration
These layers are vital for the performance, reliability, and miniaturization of semiconductor devices.
Streamlining PECVD Processes
Electro Magnetic Applications, Inc. (EMA) supports semiconductor manufacturers by optimizing plasma processes through advanced, physics-based simulation. Using Ansys Charge Plus, EMA enables manufacturers to:
- Optimize processes without costly trial and error
- Understand plasma-surface interactions
- Scale reactor designs efficiently
- Easily integrate new materials and structures into existing workflows
Charge Plus PECVD simulations include:
- 3D flow distribution, coupled for co-simulation
- Inclusion of dual-frequency RF excitation for plasma control
- Accurate modeling of plasma sheath near substrates, preventing unwanted species penetration
Multiphysics Integration
Charge Plus completes multiphysics plasma simulations by combining:
- Time-Domain Electrodynamics: Uses implicit finite-element methods with quasi-static and full-wave options
- Particle-in-Cell (PIC): Tracks macroparticles through finite element mesh with energy-conserving implicit time stepping
- Computational Fluid Dynamics (CFD): Models compressible, laminar flow of charged ideal gases and fluids
- Reaction Solver: Employs PIC-Monte Carlo collision models for inelastic energy loss, defined with cross-section data
From Simulation to Solutions
EMA’s consulting services go beyond simulation. Our team of experts works closely with semiconductor manufacturers to:
- Analyze and optimize plasma processes
- Troubleshoot manufacturing challenges
- Implement best practices for device fabrication
- Train teams on advanced simulation tools and methodologies
Take a closer look at how we simulate plasmas and the PECVD process by watching the Solving Electromagnetic Challenges webinar “Simulating the Future of PECVD: Better Processes, Better Devices.” We demonstrate how Charge Plus optimizes PECVD processes, reduces trial and error experimentation, and unlocks measurable yield improvements. You can watch by clicking here.
Take your plasma simulations to the next level by contacting EMA by clicking here.
